7/10/13

7/10/13

Things to do:

1. Try a new pattern with vertical lines only. 4 lines (3,5,10, and 30 microns in length). Try 3 or more different arrays at time, all on the same chip to limit variables. We want to test different line doses and center to center spacing to see if either variable makes a difference to how many CNTs we are able to stick.

Things that were done:

1. Two NPGS runs both with spot size 1 at 1.5 kV. On the first run we had three arrays, the first array we used as a control with a line dose of 50 nC/cm (same line dose we have always used) and a center to center distance of 11.92nm (~12nm is what we have been using). The second array we changed the line dose to 75nC/cm. The third array we changed the center to center distance to 5.04nm. In the second run we used our first array as a control with the same settings as specified above. The second array we changed the line dose to 25nC/cm and the third array we changed the center to center distance to 3.21nm.

   - All arrays resulted in very thick lines. My guess is that we were out of focus.
To fix for focus issues we should try and focus on a single silver nano particle and/or focus on multiple areas of the wafer.

2. Going to try one more run today to see if I can get the SEM in focus for NPGS and try the different arrays listed above.